RI was very happy to host Prof. Hiroshi Kawata from KEK, the Japanese High Energy Accelerator Research Organization, for a discussion on compact Energy Recovery Linacs (cERL) and their future applications. Kawata-san leads the Innovation Center for Applied Superconducting Accelerators (iCASA), which is investigating the use of cERLs as next generation light sources for extreme ultra-violet (EUV) lithography.
As famously projected by Gordon Moore, chip features are becoming ever smaller. The 2022 International Roadmap for Devices and Systems (IRDS)predicts that around 2031 light of even shorter wavelength (l=6.Xnm) than the presently used 13.5 nm will be required to meet market demand. Electron accelerators based on the cERL may be the source of choice because of the high EUV light intensity, full polarization control, and the high energy efficiency they offer.
iCASA presently works on the development plan for an EUV FEL light source at KEK and the required funding. We at RI are happy to get involved at this early stage and point out which solutions from related projects are already available or can be provided in the required time. Certainly, a demanding project such as an ERL for EUV lithography will require a close collaboration between experts in industry and academia and involve experts from around the world.
The visit allowed us to demonstrate RI’s expertise in building SRF cavities and SRF cryomodules, as well as photo injectors and complete accelerator systems, through a tour of our production and test facilities. We benefited a lot from Kawata-san's visit and look forward to further discussions with his colleagues and the lithography experts.