XUV / EUV solutions

Extreme ultraviolet radiation known as EUV or XUV, has a wavelength of 1 nm to 50 nm. XUV-based technologies offer the unique possibility to combine spatial resolution of a few nanometers with sub-micrometer penetration depths and natural elemental and/or chemical contrast.

RI Research Instruments provides XUV-based technologies and solutions, which are of special interest for nanoscopy and nanolytics and for EUV lithography infrastructure. We deliver stand-alone tools to world leading semiconductor companies and research labs and have a diverse portfolio also supporting a range of research activities from soft X-ray investigations of biological tissues to VUV (vacuum ultra-violet) applications for solar research and photochemistry.

EUV mask blank reflectometer

EUV lithography

With the growing importance of chip mass production with EUV lithography (EUVL), there is an increasing need for actinic EUV solutions at the lithography wavelength of 13.5 nm, for metrology and tools for research, development, and in supply chain quality control.

RI Research Instruments contributes to establishing a sustainable EUV lithography infrastructure by developing actinic technology and tools, for instance stand-alone tools for EUV resist, pellicle, mask blank and mask characterization, which we deliver to world leading semiconductor companies and research labs. Our broad source portfolio of cutting-edge solutions is based on more than twenty years of experience with EUV and soft X-ray applications and our strong expertise in engineering, design, controls, manufacturing, cleanroom, and UHV.

RI’s EUV/XUV portfolio

Our building blocks, solutions and tools include:

  • Stand-alone DPP and LPP sources for XUV, EUV and soft X-rays with application tailored interfaces (debris mitigation, SPF, collectors) available in grades for R&D and for industrial use
  • Metrology tools for XUV source characterization
  • Actinic EUV tools for EUV-lithography supply chain such as:
    • EUV-MBR: EUV Mask Blank Reflectometer for spectral reflectometry
    • EUV-AIMER: full reticle inband EUV mapping reflectometry
    • EUV-PRTT: EUV Pellicle reflection and transmission measurement tool
    • EUV-TEUVL and EUV-LET: Actinic EUV resists flush or interference exposing for tests on sensitivity and resolution
  • Soft X-ray and EUV-microscopes
  • Solutions for spectrometry, nanotechnology, photochemistry
  • Solutions for EUV irradiation and interaction studies

Customer specific developments

At RI we provide more than just off-the-shelf solutions for actinic tools for EUV lithography, soft X-ray, and VUV applications. A core part of our business is to develop, design, manufacture, test and deliver systems and components tailored to the needs of our customers. With an established network of experienced partners, our developments are based on well-proven building blocks and components, backed by our experience in fast realization from drafted demands to dedicated tool operation at customers’ site.

Our research and application laboratories support such developments by enabling proof of concepts or tests of critical components with available EUV-sources, components and test installations.

Haupsitz Bergisch-Gladbach

RI Research Instruments GmbH
Friedrich-Ebert-Straße 75
51429 Bergisch Gladbach

Tel.: +49 2204 – 7062 – 2500
Fax: +49 2204 – 7062 – 2501

Standort Dortmund

RI Research Instruments GmbH
Hauert 15
44227 Dortmund

Tel.: +49 2 31 - 476459 - 0
Fax: +49 2 31 - 476459 - 77

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