XUV / EUVsolutions

Extreme ultraviolet radiation (EUV, XUV) covers the spectral range between X-rays and vacuum ultraviolet. Working in this spectral range offers the unique possibility to combine spatial resolution of a few nanometer with sub-micrometer penetration depths and natural elemental and/or chemical contrast.

RI provides technology and solutions in the wavelength regime from 1 nm to 50 nm enabling new perspectives in applications like nanoscopy and nanolytics.

Actinic inspection tool for characterizationof EUV mask blanks

Our long term experience in EUV/XUV photon applications enables us to provide new stand-alone metrology solutions that fill the gap between conventional X-ray tube based tools and end-stations at large science installations. Our EUV/XUV high performance products and solutions are used in many world leading laboratories of the semiconductor industry, in material and life sciences as well as in nanotechnology

Our EUV/XUV high performance products and solutions are used in many world leading laboratories and high volume manufacturing of the semiconductor industry, in material and life sciences as well as in nanotechnology.

1. EUV sources

Stand-alone EUV metrology sources for laboratory applications


  • Metrology sources based on Laser Produced Plasma (LPP) & Discharge Produced Plasma (DPP)
  • Pulse-to-pulse process automation
  • Active feedback dose control

  • EUV power stabilization
  • Broadband EUV or line emission (1 - 50 nm)
  • Different brightness and source sizes available
  • Tailored debris mitigation and SPF
  • 24/7 operation possible
  • High uptime and MTBF

2. EUV metrology tools

EUV metrology tools for source characterization


  • E-MON, absolute in-band pulse energy (power) measurement

  • E-SPEC, emission spectra determination

  • E-CAM, spatial profiles detection

  • E-DIODE, temporal profile recording
  • E-FOC, in-focus beam profile registration
  • E-IRRAD, in-focus beam power monitoring

3. Arctinic metrology and inspection tools

Our products are applied in


  • EUV mask and mask blank reflectometry

  • Actinic blank inspection
  • Actinic EUV microscopy (reflection, transmission, dark-field)
  • Actinic irradiation for photo resist and material qualification.

With our tools for EUV resist and material irradiation exposure experiments we achieve



  • high accuracies in determination of resist sensitivity (TEUVL)

  • high dose per pulse (> 10 mJ/mm²)
  • high power (> 2 W/cm²)

Our blank inspection microscope test bench for actinic blank inspection (ABIT) has demonstrated its applicability within routine mask inspection. With our R&D test bench, buried defects of less than 30 nm were revealed.

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Corporate Headquarters

RI Research Instruments GmbH
Friedrich-Ebert-Str. 75
51429 Bergisch Gladbach
Germany

Contact Information

Tel.: +49 2204-70622500
Fax: +49 2204-70622501

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