Extreme ultraviolet radiation (EUV, XUV) covers the spectral range between X-rays and vacuum ultraviolet. Working in this spectral range offers the unique possibility to combine spatial resolution of a few nanometer with sub-micrometer penetration depths and natural elemental and/or chemical contrast.
RI provides technology and solutions in the wavelength regime from 1 nm to 50 nm enabling new perspectives in applications like nanoscopy and nanolytics.
Actinic inspection tool for characterizationof EUV mask blanks
Our long term experience in EUV/XUV photon applications enables us to provide new stand-alone metrology solutions that fill the gap between conventional X-ray tube based tools and end-stations at large science installations. Our EUV/XUV high performance products and solutions are used in many world leading laboratories of the semiconductor industry, in material and life sciences as well as in nanotechnology
Our EUV/XUV high performance products and solutions are used in many world leading laboratories and high volume manufacturing of the semiconductor industry, in material and life sciences as well as in nanotechnology.
1. EUV sources
Stand-alone EUV metrology sources for laboratory applications
2. EUV metrology tools
EUV metrology tools for source characterization
3. Arctinic metrology and inspection tools
Our products are applied in
With our tools for EUV resist and material irradiation exposure experiments we achieve
Our blank inspection microscope test bench for actinic blank inspection (ABIT) has demonstrated its applicability within routine mask inspection. With our R&D test bench, buried defects of less than 30 nm were revealed.Download PDF
RI Research Instruments GmbH
51429 Bergisch Gladbach
Tel.: +49 2204-70622500
Fax: +49 2204-70622501
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